Extreme Ultraviolet Lithography (EUVL) Systems Market by Light Source (Laser Produced Plasmas (LPP), Vacuum Sparks, and Gas Discharges), Tool (Light Source, Mirrors, Mask ), and Application (Memory, IDM, Foundry ) - Global Opportunity Analysis and Industr

According to a new report published by Allied Market Research, titled; "Extreme Ultraviolet Lithography (EUVL) Systems Market by Type, by Light Source, Equipment, and Application: Global Opportunity Analysis and Industry Forecast, 2014-2022," the extreme ultraviolet lithography (EUVL) systems market was valued at $650 million in 2015 and is projected to reach $1,195 million by 2022, growing at a CAGR of 9.2% from 2016 to 2022. The laser-produced plasmas segment held major share in the total market in 2015.

Efficient execution of EUVL technology is anticipated to enable it to replace other optical lithography techniques over the course of next few years. By using these nanotechnology semiconductors manufacturers will be able to get compact electronics chips with less power requirements.

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Extreme ultraviolet lithography (EUVL) is a modern process for fabricating microprocessors, which are hundred times more efficient than the current ones available in the market. This technology allows storage of more information. EUVL replaces other optical lithography techniques, currently used to fabricate microcircuits, which we use in our devices.

Factors that assist the market growth include ability of the EUVL system to offer enhanced resolving power and high productivity. However, EUVL is a complex technology that requires all new step-and-scan systems for production of semiconductors, which restricts the market growth. Reduction in size of transistors and electronic circuits within microprocessors increases the density and power of these systems, expected to provide lucrative opportunity for the market growth.

Based on light source, laser-produced plasmas contributed the largest revenue share in the market in 2015. Owing to their advantages such as short-pulse and high average power laser beam than other sources. However, over the next few years, vacuum spark segment is anticipated to be one of the fastest growing light source in terms of revenue in the global extreme ultraviolet lithography system market.

Memory segment dominated with more than 40% share in EUVL systems market, in 2015. The other optical lithography techniques, which are currently prevalent have several limitations, such as storage space constraint, large size, and low data transmission speed. Advent of EUVL systems have removed these limitations. The new systems feature very high speed and large storage space. The rise in sale of electronic devices and increase in trend of internet of things (IoT), which require large space, are anticipated to create a huge demand in EUVL system market for big storage systems.

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In 2015, Asia-Pacific accounted for over half of the total EUVL systems market and is expected to retain its dominant position owing to the presence of several emerging nations with high share in the consumer electronics market, well-established semiconductor industry, and presence of key market players.

The major companies profiled in the report include ASML, Canon Inc., Intel Corporation, Nikon Corporation, NuFlare Technology Inc., Samsung Corporation, SUSS Microtec AG, Taiwan Semiconductor Manufacturing Company Limited (TSMC), Ultratech Inc., and Vistec Semiconductor Systems.

Analyst Review:

Extreme ultraviolet lithography (EUVL) is a cutting-edge technology for manufacturing microprocessors, which are several times more efficient than the ones currently available in the market. Leading players in the market such as Intel, AMD, and Motorolla have joined with the U.S. Department of Energy in a three-year project to fabricate a microchip with etched circuit lines lesser than 0.1 micron in width. A microprocessor made with the EUVL technology is expected to be several times more powerful than the microprocessors being used currently. This technology will increase the storage space.

EUVL strives to replace the other optical lithography techniques used currently to fabricate microcircuits, which we use in our devices. EUVL is alike optical lithography in which light is deflected through camera lenses onto the wafer. Although extreme ultraviolet light, functioning at a different wavelength, has unlike properties and must be reflected from mirrors instead of refracted from lenses, the challenge is to shape mirrors perfectly so that they can reflect the light with adequate precision. Intel is researching on some early prototypes.

Laser-produced plasmas, which feature short-pulse and high average power laser beam, dominate the extreme ultraviolet lithography systems. However, over the next few years, vacuum spark is anticipated to be one of the fastest growing light source in terms of revenue.

The EUVL market in Asia-Pacific region has the largest share across all the geographies owing to the presence of developing countries that have a prosperous consumer electronics and a clear dominance in the semiconductor market. Furthermore, the North America accelerometer & gyroscope market size is anticipated to grow very rapidly in years to come, owing to several government initiatives and presence of key players, which invest heavily on its R&D.

LIST OF FIGURES

FIGURE 1. MARKET SEGMENTATION
FIGURE 2. TOP IMPACTING FACTORS
FIGURE 3. TOP WINNING STRATEGIES: PERCENTAGE DISTRIBUTION (2013-2016)
FIGURE 4. TOP INVESTMENT POCKETS IN GLOBAL EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL) SYSTEMS MARKET, BY APPLICATION
FIGURE 5. BARGAINING POWER OF SUPPLIERS
FIGURE 6. BARGAINING POWER OF BUYERS
FIGURE 7. THREAT OF SUBSTITUTES
FIGURE 8. THREAT OF NEW ENTRANTS
FIGURE 9. INTENSITY OF COMPETITIVE RIVALRY
FIGURE 10. MARKET SHARE ANALYSIS, 2015
FIGURE 11. COMPARATIVE REGIONAL SHARE ANALYSIS OF LASER PRODUCED PLASMAS (LPP) LIGHT SOURCE MARKET, 2015 & 2022 (%)
FIGURE 12. GLOBAL LASER PRODUCED PLASMAS (LPP) LIGHT SOURCE MARKET, 2014-2022 ($MILLION)
FIGURE 13. GLOBAL LASER PRODUCED PLASMAS (LPP) LIGHT SOURCE MARKET ANALYSIS, 2015 & 2022
FIGURE 14. COMPARATIVE REGIONAL SHARE ANALYSIS OF VACUUM SPARKS LIGHT SOURCE MARKET, 2015 & 2022 (%)
FIGURE 15. GLOBAL VACUUM SPARKS LIGHT SOURCE MARKET, 2014-2022 ($MILLION)
FIGURE 16. GLOBAL VACUUM SPARKS LIGHT SOURCE MARKET ANALYSIS, 2015 & 2022
FIGURE 17. COMPARATIVE REGIONAL SHARE ANALYSIS OF GAS DISCHARGE LIGHT SOURCE MARKET, 2015 & 2022 (%)
FIGURE 18. GLOBAL GAS DISCHARGE LIGHT SOURCE MARKET, 2014-2022 ($MILLION)
FIGURE 19. GLOBAL GAS DISCHARGE LIGHT SOURCE MARKET ANALYSIS, 2015 & 2022
FIGURE 20. COMPARATIVE REGIONAL SHARE ANALYSIS OF EUVL SYSTEMS LIGHT SOURCE MARKET, 2015 & 2022 (%)
FIGURE 21. GLOBAL EUVL SYSTEMS LIGHT SOURCE MARKET, 2014-2022 ($MILLION)
FIGURE 22. GLOBAL EUVL SYSTEMS LIGHT SOURCE MARKET ANALYSIS, 2015 & 2022
FIGURE 23. COMPARATIVE REGIONAL SHARE ANALYSIS OF EUVL SYSTEMS MIRRORS MARKET, 2015 & 2022 (%)
FIGURE 24. GLOBAL EUVL SYSTEMS MIRRORS MARKET, 2014-2022 ($MILLION)
FIGURE 25. GLOBAL EUVL SYSTEMS MIRRORS MARKET ANALYSIS, 2015 & 2022
FIGURE 26. COMPARATIVE REGIONAL SHARE ANALYSIS OF EUVL SYSTEMS MASK MARKET, 2015 & 2022 (%)
FIGURE 27. GLOBAL EUVL SYSTEMS MASK MARKET, 2014-2022 ($MILLION)
FIGURE 28. GLOBAL EUVL SYSTEMS MASK MARKET ANALYSIS, 2015 & 2022
FIGURE 29. COMPARATIVE REGIONAL SHARE ANALYSIS OF EUVL SYSTEMS OTHERS EQUIPMENT MARKET, 2015 & 2022 (%)
FIGURE 30. GLOBAL EUVL SYSTEMS OTHERS EQUIPMENT MARKET, 2014-2022 ($MILLION)
FIGURE 31. GLOBAL EUVL SYSTEMS OTHERS EQUIPMENT MARKET ANALYSIS, 2015 & 2022
FIGURE 32. COMPARATIVE REGIONAL SHARE ANALYSIS OF EUVL SYSTEMS MEMORY APPLICATION MARKET, 2015 & 2022 (%)
FIGURE 33. GLOBAL EUVL SYSTEMS MEMORY APPLICATION MARKET, 2014-2022 ($MILLION)
FIGURE 34. GLOBAL EUVL SYSTEMS MEMORY APPLICATION MARKET ANALYSIS, 2015 & 2022
FIGURE 35. COMPARATIVE REGIONAL SHARE ANALYSIS OF EUVL SYSTEMS IDM APPLICATION MARKET, 2015 & 2022 (%)

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