Nanoimprint Lithography System Market will reach 140 million US$ by the end of 2025

This report studies the global Nanoimprint Lithography System market status and forecast, categorizes the global Nanoimprint Lithography System market size (value & volume) by manufacturers, type, application, and region. This report focuses on the top manufacturers in North America, Europe, Japan, China, and other regions (India, Southeast Asia, Central & South America, and Middle East & Africa).

Imprinting technology is an ancient technique for the reproduction of writings on appropriate supports. Since 1990´s, one of the imprinting techniques, i.e., injection moulding has been used for compact disk (CD) production. More recently, the semiconductor industry is interested in imprint related techniques because of the mass production requirement of future microelectronic circuits with a possible critical dimension down to a few nanometers. At this deep nanometer scale, traditional photolithography is supposed to rule out because of the optical diffraction or material limitations. In fact, the actual minimum feature size in an integrated circuit (IC) is already less than 50 nm and the actual manufacturing systems are already extremely sophisticated and expensive. The semiconductor industry has always been looking for alternative patterning methods in order to follow Moore´s law, which has been formulated to predict the evolution of the technology nodes. Now, extreme UV lithography (EUV), 193 nm immersion lithography, mask less lithography (MLL) techniques and nanoimprint lithography (NIL) are considered as candidates for the so called Next Generation Lithography (NGL) at 32 nm and 22 nm nodes. In parallel, imprint technology has been promoted by a large scientific community and non-IC industry segments including high-density storage, optoelectronics, telecommunication as well as biochips or micro total analysis systems.

Nanoimprint lithography is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint resist is typically a monomer or polymer formulation that is cured by heat or UV light during the imprinting. Adhesion between the resist and the template is controlled to allow proper release.

With regards to this, key players of nanoimprint lithography system industry are expected to find potential opportunities in this market. The world leading vendors in the market are Obducat which accounted the revenue market share of 35.90%, followed by EV Group and Canon.

The global Nanoimprint Lithography System market is valued at 49 million US$ in 2017 and will reach 92 million US$ by the end of 2025, growing at a CAGR of 8.2% during 2018-2025.

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The major manufacturers covered in this report

Obducat

EV Group

Canon (Molecular Imprints)

Nanonex

SUSS MicroTec

GuangDuo Nano

Geographically, this report studies the top producers and consumers, focuses on product capacity, production, value, consumption, market share and growth opportunity in these key regions, covering

North America

Europe

China

Japan

Southeast Asia

India

On the basis of product, this report displays the production, revenue, price, market share and growth rate of each type, primarily split into

Hot Embossing (HE)

UV-based Nanoimprint Lithography (UV-NIL)

Micro Contact Printing (µ-CP)

On the basis of the end users/applications, this report focuses on the status and outlook for major applications/end users, consumption (sales), market share and growth rate for each application, including

Consumer Electronics

Optical Equipment

Others

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