Plasma Etching Equipment Market - Analysis and In-depth Research on Size, Trends, Emerging Growth Factors and Forecasts 2022

Plasma etching is a type of plasma processing used extensively in the fabrication process of integrated circuit. Plasma etching is also referred to as dry etching system, as the conventional etching technique is carried out with various corrosive wet chemical acids. During the process of plasma etching, the material to be etched is converted from solid state to gaseous state by the plasma of the process gases and a vacuum pump is used to extract the gaseous products.

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Generally, three basic etching processes including ion etching, chemical plasma etching and reactive ion etching are used to fabricate integrated circuits depending on applications for which it is used. The overall market growth of plasma etching equipment is majorly dependent on the growth of the semiconductor market across the globally.

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Rising demand for compact, energy efficient and electronic devices having enhanced performance is predicted to trigger the need of developing miniature semiconductor integrated circuits. For miniaturizing integrated circuit, the circuit have to undergo advanced circuit fabrication process with small geometries and thus requires precise pattern transfer.

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This in turn is anticipated to boost the demand for plasma etching equipment during the forecast period from 2017 to 2025. In addition, enormous technological upgradation taking place in the IoT (Internet of Thing) application in order to provide technologically advanced smart devices to different consumers across the globe is also predicted to accelerate the demand of advanced semiconductors in the coming eight years

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