Isabellenhütte Heusler GmbH & Co. KG, the leading global manufacturer of low-ohmic precision and power resistors, has been increasing its presence in Japan since the beginning of 2012. The subsidiary Isabellenhuette Kabushi Kaisha (IH-KK) operates from Nihonbashi, one of Tokyo’s oldest business districts.

IH-KK organises the sales of Isabellenhütte’s components and measurement products as well as the product sales for three trading partners of large Japanese companies, including Hitachi. IH-KK also aims to boost the company’s new and direct business in Japan. Toshiya Murase is its general manager; he was born in Japan, is an electro-chemical engineer and holds US citizenship. By his side, as second in command, is Ryota Katsube. He is a former employee of Isabellenhütte’s Japanese representative Aicos.

By establishing the new Japanese subsidiary IH-KK, Isabellenhütte Heusler GmbH & Co. KG aims to further advance its internationalisation. There are plans to set up further subsidiaries in other Asian countries.

The roots of Isabellenhütte Heusler GmbH & Co. KG, Germany, stretch back over 500 years in metal smelting and processing. First recorded in 1482, the company has been owned by the Heusler family since 1827. Today, the company is one of the leading global manufacturers of low-ohmic precision and power resistors. The company also produces thermoelectric and resistance alloys and measurement technology products. Around 720 staff are employed at its headquarters and production works in Dillenburg, Hesse.

www.isabellenhuette.de

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Isabellenhütte is exhibitor at electronica 2012, hall B6, stand 436

Company contact:
Isabellenhütte Heusler GmbH & Co. KG
Eibacher Weg 3 - 5
D-35683 Dillenburg
Klaus Weber
Area Sales Manager Asia
Tel.: +49 2771 / 934-281
Mobile: +49 170 / 779 0830
klaus.weber@isabellenhuette.de

Press contact:
Wassenberg Public Relations für
Industrie & Technologie GmbH
Rollnerstr. 43
D-90408 Nürnberg
Michaela Wassenberg
Tel.: +49 911 / 598 398-0
Fax: +49 911 / 598 398-18
m.wassenberg@tech-communications.net

This release was published on openPR.